Dual Beam Helios 600

The Dual Beam Helios 600 model consists of a 30 kV field-emission scanning electron column and a 30 kV Ga focused ion beam placed at 52º one from each other. The ion column is able to work properly at low voltage (5 kV and lower), allowing the preparation of lamellae with low ion damage. In this equipment, there are five gas injectors which allow the growth of nano-deposits with high resolution, such as W-based superconducting nano-deposits with lateral size of 40 nm and Co-based ferromagnetic nano-deposits with a lateral size of 30 nm. These ultranarrow dimensions are at the forefront of research in these topics.